Resistance ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma ye kɛ gamma Dual frequency, dual source distance, symmetric structure coil system, with multiple detection depth, high longitudinal resolution. Dual frequency, dual source distance, symmetric structure coil system, with multiple detection depth, high longitudinal resolution. Dual frequency, dual source distance, symmetric structure coil system, with multiple detection depth, high longitudinal resolution. Ka tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛm A tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ a tɛmɛ Sisitɛm de tɛmɛ ye tɔ̈u në tɛmɛ de tɛmɛ de tɛmɛ de tɛmɛ de tɛmɛ de tɛmɛ; A naŋ software de auto-correction de well-eye impact ku a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, a leŋ-a, A ye tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ.

2MHz |
400 KHz |
Gamma natüral (NGR) |
|
■ Phase Difference
◆ 0.1~2000(ohm-m)
◆ ±0.6%(0.1~50ohm-m)
◆ ± 0.3mS/m (ye 50 ohm-m)
■ Amplitude ratio
◆ 0.1~500(ohm-m)
◆ ±0.8%(0.1~25ohm-m)
◆ ± 0.45mS/m (ye 25ohm-m)
■ Resolution ye cɔl longitudinal (Rshouder=1.0 ohm-m, Rbed=0.2 ohm-m)
◆ 0.2m
|
■ Phase Difference
◆ 0.1~1000(ohm-m)
◆ ±1.35%(0.1~25ohm-m)
◆ ± 0.5mS/m (ye 25ohm-m)
■ Amplitude ratio
◆ 0.1~200(ohm-m)
◆ ±2%(0.1~10ohm-m)
◆ ±6mS/m (ye tɔ̈u në 10ohm-m)
■ Resolution ye cɔl longitudinal (Rshouder=1.0 ohm-m, Rbed=0.2 ohm-m)
◆ 0.5m
|
■ Range of measurement
◆ 0~500(API)
■ Kuɛl
◆ ±2 API @ 100 API
■ Longitudinal Resolution
◆ 172mm(6.8″)
|
Tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ |
Tɛmɛ tɛmɛ: 20000 psi |
Tɛɛr: 3480 mm |
GS-Res 350
GS-Res 650
GS-Res 1200
GS-Res aye luɔ̈ɔ̈i në luɔɔi de kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl ye kɔl. Në ye mɛn, yen acï bɛ̈n ya looi në luɔɔi de Zhaoping 1, Xu 50-Ping 14, Kuolong Nanping 41, ku jɔl ya luɔɔi kɔ̈k peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei peei pee Resistance will be called a standard configuration instrument for horizontal well operations in the future. Resistance will be called a standard configuration instrument for horizontal well operations in the future. Resistance will be called a standard configuration instrument for horizontal well operations in the future.